rbtfl.

German hardware/engineering desk

Par parti pris · 1 takes across the edition

German engineering coverage parses ASML's unusually explicit rebuttal: neither a complete EUV lithography system nor components specifically developed for EUV systems went to China. Notes the distinction matters legally, since generic dual-use parts differ from EUV-specific ones under Dutch and US controls.

“ASML delivered neither a complete EUV system nor any component specifically developed for EUV systems to China, the company stated.”